blog.imm.cnr.it

Dear Colleagues,

I am writing on behalf of the organizing committee to invite you to the Atomic Layer Infiltration and Deposition for Functional Hybrid Materials Workshop that is will take place at the Technion - Israel Institute of Technology at Haifa, Israel during Sept. 10th–13th, 2023.

This workshop aims to bring together researcher from academia, government, and industry working on ALD-derived techniques for functional materials, including sequential infiltration synthesis (SIS)/ vapor-phase infiltration (VPI)/ atomic layer infiltration (ALI), as well as molecular layer deposition (MLD), to discuss new and cutting-edge fundamental and applied science of these techniques towards functional hybrid materials. This workshop follows the successful inaugural SIS 2019 workshop in Milan and the SIS 2020 held virtually. The upcoming workshop is planned to be an extended workshop that will include recent advances in ALD-based techniques for functional hybrid materials.

I encourage you and/or your students and postdocs to submit abstracts:
https://ali2023.net.technion.ac.il/

On behalf of the organizing committee:

Tamar Segal-Peretz, Technion – Israel Institute of Technology, Israel

Gabriele Seguini, IMM-CNR, Italy 

Michele Perego, IMM-CNR, Italy

Chang-Yong Nam, Brookhaven National Laboratory, USA

Eran Edri, Ben-Gurion University, Israel